Optical element and illumination optics for microlithography
US8411251B2 · kind B2 · utility
1Cited by
25References
19Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Mar 27, 2009 |
| Grant date | Apr 2, 2013 |
| Priority date | — |
| Expiry date | Mar 6, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70083
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The disclosure relates to an optical element and illumination optics for microlithography. The optical element can be configured to influence a nominal beam angle, preset over a beam cross-section, of a radiation beam hitting the optical element. Moreover, the disclosure relates to an illumination optics for the microlithography with at least one such optical element and an illumination system for the microlithography with such an illumination optics.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.