Grazing incidence collector for laser produced plasma sources
US8411815B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 28, 2009 |
| Grant date | Apr 2, 2013 |
| Priority date | — |
| Expiry date | Mar 22, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG21K2201/067
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Grazing incidence collectors (GICs) for extreme ultraviolet (EUV) and X-ray radiation sources, such as laser produced plasma (LPP) sources, are disclosed. Source-collector systems comprising GICs and LPP sources are also disclosed. A laser beam is directed along the collector axis to a fuel target to form the LPP source, and the collector is arranged to collect the radiation and reflect it to an intermediate focus. The collector may include one or more grazing-incidence mirrors, and these mirrors may be electroformed. lithography systems that employ the source-collector systems as disclosed herein.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.