Resist composition, method of forming resist pattern, compound and method of producing the same, acid generator
US8415082B2 · kind B2 · utility
6Cited by
15References
7Claims
0Family size
Assignee
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Key dates
| Filing date | Apr 22, 2010 |
| Grant date | Apr 9, 2013 |
| Priority date | — |
| Expiry date | Sep 27, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0046
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A resist composition including a base material component (A) which exhibits changed solubility in an alkali developing solution under action of acid, and an acid generator component (B) which generates acid upon exposure,
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.