System for monitoring haze of a photomask
US8422760B2 · kind B2 · utility
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20Claims
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Key dates
| Filing date | Oct 16, 2009 |
| Grant date | Apr 16, 2013 |
| Priority date | — |
| Expiry date | Sep 8, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/84
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A system for monitoring haze of a photomask includes an installation unit in which a photomask is mounted, a light emission unit emitting a light beam to the photomask installed on the installation unit, a detection unit detecting a diffraction pattern of the light beam emitted by the light emission unit and passed through the photomask, and an analysis unit analyzing the diffraction pattern detected by the detection unit.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.