Jin-sik Jung
4Patents
1h-index
12Co-inventors
34Inventor score
Filing activity: Jun 6, 2006 → Oct 16, 2009
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7745072B2 | Method of correcting critical dimension in photomask and photomask having corrected critical dimension using the method | Physics | 3 | Active |
| US7745068B2 | Binary photomask having a compensation layer | Physics | 1 | Active |
| US7989123B2 | Photomask including ion trapping layer and method of manufacturing semiconductor device using the photomask | Physics | 0 | Active |
| US8422760B2 | System for monitoring haze of a photomask | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.