Thermal anneal of block copolymer films with top interface constrained to wet both blocks with equal preference
US8426313B2 · kind B2 · utility
27Cited by
91References
32Claims
0Family size
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Inventors
Key dates
| Filing date | Mar 21, 2008 |
| Grant date | Apr 23, 2013 |
| Priority date | — |
| Expiry date | Dec 24, 2029 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB81C2201/0198
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Methods for fabricating sublithographic, nanoscale microstructures utilizing self-assembling block copolymers, and films and devices formed from these methods are provided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.