Device with microstructure and method of forming such a device
US8426928B2 · kind B2 · utility
4Cited by
0References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 29, 2010 |
| Grant date | Apr 23, 2013 |
| Priority date | — |
| Expiry date | Oct 29, 2030 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB81C2203/0145
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
Disclosed is a device comprising a substrate carrying a microscopic structure in a cavity capped by a capping layer including a material of formula SiNxHy, wherein x>1.33 and y>0. A method of forming such a device is also disclosed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.