Patent · US Active

Radiation-sensitive resin composition

US8431324B2 · kind B2 · utility

1Cited by

2References

4Claims

0Family size

Assignee

JSR CORPORATION · JP

Inventors

Tsutomu Shimokawa · Tokyo, JP
Takuma Ebata · Tokyo, JP

Key dates

Filing date	May 7, 2010
Grant date	Apr 30, 2013
Priority date	—
Expiry date	Nov 12, 2030

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/0397
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A radiation-sensitive resin composition includes a resin, a radiation-sensitive acid generator, an acid diffusion controller, and a mixed solvent. The radiation-sensitive acid generator includes a compound (I) shown by a following general formula (I). The mixed solvent includes about 50 mass % to about 90 mass % of propylene glycol monomethyl ether acetate,wherein M+ represents a sulfonium cation or an iodonium cation, R represents a hydrogen atom or a hydrocarbon group having 1 to 8 carbon atoms, Rf represents a fluorine atom or a perfluoroalkyl group having 1 to 4 carbon atoms, n represents an integer from 1 to 10, and m represents an integer from 1 to 4.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.