Patent · US Active

Lithographic apparatus and monitoring method

US8432529B2 · kind B2 · utility

4Cited by

2References

17Claims

0Family size

Assignee

ASML NETHERLANDS B.V. · NL

Inventors

Bert Claessens · Spalbeek, BE
Paul Van Der Veen · Waalre, NL
Herman Philip Godfried · Amsterdam, NL

Key dates

Filing date	Jun 24, 2010
Grant date	Apr 30, 2013
Priority date	—
Expiry date	Jul 1, 2031

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/7085
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A lithographic apparatus including a radiation beam monitoring apparatus, the radiation beam monitoring apparatus including an optical element configured to generate a diffraction pattern, and an imaging detector located after the optical element and not in a focal plane of the optical element such that the imaging detector is capable of detecting a mixture of spatial coherence and divergence of the radiation beam.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.