Near non-adaptive virtual metrology and chamber control
US8433434B2 · kind B2 · utility
4Cited by
4References
20Claims
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Key dates
| Filing date | Apr 23, 2010 |
| Grant date | Apr 30, 2013 |
| Priority date | — |
| Expiry date | Jun 8, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG05B13/048
- WIPO fieldControl
- WIPO sectorInstruments
Abstract
Embodiments of the present invention relate to a method for a near non-adaptive virtual metrology for wafer processing control. In accordance with an embodiment of the present invention, a method for processing control comprises diagnosing a chamber of a processing tool that processes a wafer to identify a key chamber parameter, and controlling the chamber based on the key chamber parameter if the key chamber parameter can be controlled, or compensating a prediction model by changing to a secondary prediction model if the key chamber parameter cannot be sufficiently controlled.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.