Formation of patterned media by selective anodic removal followed by targeted trench backfill
US8435399B2 · kind B2 · utility
0Cited by
7References
11Claims
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Key dates
| Filing date | Jan 11, 2010 |
| Grant date | May 7, 2013 |
| Priority date | — |
| Expiry date | Mar 12, 2031 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24355
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A method is disclosed for defining discrete magnetic and non-magnetic regions on the magnetic film layer of a storage media substrate. The method applies anodic oxidation of a cobalt-containing magnetic film layer to remove cobalt, followed by controlled deposition of a non-magnetic matrix into the regions where the cobalt has been removed. Deposition may either be electrodeposition, collimated vacuum deposition, or other methods depending upon the composition of the non-magnetic matrix being deposited. The method may be performed in a single electrochemical cell.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.