Apparatus for controlling the temperature of an RF ion source window
US8436318B2 · kind B2 · utility
8Cited by
12References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 5, 2010 |
| Grant date | May 7, 2013 |
| Priority date | — |
| Expiry date | Jan 19, 2031 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/0817
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An RF ion source utilizing a heating/RF-shielding element for controlling the temperature of an RF window and to act as an RF shielding element for the RF ion source. When the heating/RF shielding element is in a heating mode, it suppresses formation of unwanted deposits on the RF window which negatively impacts the transfer of RF energy from an RF antenna to a plasma chamber. When the heating/RF-shielding element is in a shielding mode, it provides an electrostatic shielding for the RF ion source.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.