Costel Biloiu
47Patents
6h-index
65Co-inventors
68Inventor score
Filing activity: Jun 5, 2007 → Sep 26, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9706634B2 | Apparatus and techniques to treat substrates using directional plasma and reactive gas | Electricity | 10 | Active |
| US9396902B2 | Gallium ION source and materials therefore | Electricity | 8 | Active |
| US8436318B2 | Apparatus for controlling the temperature of an RF ion source window | Electricity | 8 | Active |
| US7888662B2 | Ion source cleaning method and apparatus | Electricity | 7 | Active |
| US9060411B2 | Hardware plasma interlock system | Electricity | 6 | Active |
| US7812321B2 | Techniques for providing a multimode ion source | Electricity | 6 | Active |
| US9514912B2 | Control of ion angular distribution of ion beams with hidden deflection electrode | Electricity | 5 | Active |
| US8142607B2 | High density helicon plasma source for wide ribbon ion beam generation | Electricity | 5 | Active |
| US9293301B2 | In situ control of ion angular distribution in a processing apparatus | Electricity | 5 | Active |
| US10004133B2 | Apparatus and techniques to treat substrates using directional plasma and reactive gas | Electricity | 4 | Active |
| US10192727B2 | Electrodynamic mass analysis | Electricity | 4 | Active |
| US7999479B2 | Conjugated ICP and ECR plasma sources for wide ribbon ion beam generation and control | Emerging Cross-Sectional Technologies | 3 | Active |
| US10224181B2 | Radio frequency extraction system for charge neutralized ion beam | Electricity | 3 | Active |
| US10468226B1 | Extraction apparatus and system for high throughput ion beam processing | Electricity | 3 | Active |
| US8590485B2 | Small form factor plasma source for high density wide ribbon ion beam generation | Electricity | 3 | Active |
| US10665433B2 | Extreme edge uniformity control | Electricity | 3 | Active |
| US8659229B2 | Plasma attenuation for uniformity control | Electricity | 2 | Active |
| US11056319B2 | Apparatus and system having extraction assembly for wide angle ion beam | Electricity | 2 | Active |
| US11812539B2 | Resonator, linear accelerator configuration and ion implantation system having rotating exciter | Electricity | 2 | Active |
| US9620335B2 | In situ control of ion angular distribution in a processing apparatus | Electricity | 2 | Active |
| US11596051B2 | Resonator, linear accelerator configuration and ion implantation system having toroidal resonator | Electricity | 2 | Active |
| US10128082B2 | Apparatus and techniques to treat substrates using directional plasma and point of use chemistry | Electricity | 1 | Active |
| US9187832B2 | Extended lifetime ion source | Electricity | 1 | Active |
| US11127556B2 | Extraction apparatus and system for high throughput ion beam processing | Electricity | 1 | Active |
| US9299536B2 | Wide metal-free plasma flood gun | Electricity | 1 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.