Patent · US Active

IC device having low resistance TSV comprising ground connection

US8436475B2 · kind B2 · utility

0Cited by
0References
10Claims
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Assignee

Inventors

Key dates

Filing dateApr 11, 2012
Grant dateMay 7, 2013
Priority date
Expiry dateApr 11, 2032

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L2924/30107
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

A semiconductor device includes an integrated circuit (IC) die including a substrate, and a plurality of through substrate via (TSV) that extends through the substrate to a protruding integral tip and which is partially covered with a dielectric liner and partially exposed from the dielectric liner. A metal layer is on the bottom surface of the IC die physically connecting the plurality of TSVs and physically and electrically connected to connecting the first metal protruding tips of TSVs.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.