Optical module with minimized overrun of the optical element

US8441747B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Willi Heintel · Aalen, DE
• Hagen Federau · Augsburg, DE
• Joachim Hartjes · Aalen, DE
• Harald Kirchner · Munich, DE
• Bernhard Geuppert · Lauchheim, DE
• Ulrich Bingel · Michelfeld, DE
• Tilman Schwertner · Aalen, DE

Key dates

• Filing date: Sep 14, 2007
• Grant date: May 14, 2013
• Expiry date: Nov 24, 2029

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/70825
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

There is provided an optical module for microlithography. The optical module includes an optical element and a retaining device for holding the optical element. The optical element has (a) a main extension plane, in which it defines a radial direction R and a circumferential direction U, and (b) a free optical diameter and an overrun in the region of its outer periphery. The retaining device contacts the optical element in the region of the overrun, and is formed and/or contacts the optical element in such a manner that the overrun ratio, calculated from the overrun related to a minimum overrun necessary for the production of the optical element, is at most 1.5.