Crosslinkable graft polymer non-preferentially wetted by polystyrene and polyethylene oxide
US8445592B2 · kind B2 · utility
20Cited by
96References
21Claims
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Key dates
| Filing date | Dec 13, 2011 |
| Grant date | May 21, 2013 |
| Priority date | — |
| Expiry date | Dec 13, 2031 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24612
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
Methods for fabricating a random graft PS-r-PEO copolymer and its use as a neutral wetting layer in the fabrication of sublithographic, nanoscale arrays of elements including openings and linear microchannels utilizing self-assembling block copolymers, and films and devices formed from these methods are provided. In some embodiments, the films can be used as a template or mask to etch openings in an underlying material layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.