Molybdenum-containing targets comprising three metal elements
US8449817B2 · kind B2 · utility
5Cited by
18References
23Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 30, 2010 |
| Grant date | May 28, 2013 |
| Priority date | — |
| Expiry date | Apr 9, 2031 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31678
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The invention is directed at sputter targets including 50 atomic % or more molybdenum, a second metal element of niobium or vanadium, and a third metal element selected from the group consisting of titanium, chromium, niobium, vanadium, and tantalum, wherein the third metal element is different from the second metal element, and deposited films prepared by the sputter targets. In a preferred aspect of the invention, the sputter target includes a phase that is rich in molybdenum, a phase that is rich in the second metal element, and a phase that is rich in the third metal element.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.