Wavefront engineering of mask data for semiconductor device design
US8453076B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 16, 2010 |
| Grant date | May 28, 2013 |
| Priority date | — |
| Expiry date | Sep 17, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/705
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Optical wave data for a semiconductor device design is divided into regions. First wavefront engineering is performed on the wave data of each region, accounting for just the wave data of each region and not accounting for the wave data of neighboring regions of each region. The optical wave data of each region is normalized based on results of the first wavefront engineering. Second wavefront engineering is performed on the wave data of each region, based at least on the wave data of each region as has been normalized. The second wavefront engineering takes into account the wave data of each region and a guard band around each region that includes the wave data of the neighboring regions of each region. The second wavefront engineering can be sequentially performed by organizing the regions into groups, and sequentially performing the second wavefront engineering on the regions of each group in parallel.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.