Method and system for indirect determination of local irradiance in an optical system
US8454230B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 16, 2010 |
| Grant date | Jun 4, 2013 |
| Priority date | — |
| Expiry date | Dec 27, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01J2005/0077
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The invention concerns a method for the indirect determination of local irradiance in an optical system; wherein the optical system comprises optical elements between which an illuminated beam path is formed and a measurement object which absorbs the radiation in the beam path at least partially is positioned in a partial region of the beam path selected for the locally-resolved determination of the irradiance and the temperature distribution of at least one part of the measurement object is determined by means of a temperature detector.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.