Frank Melzer
21Patents
9h-index
31Co-inventors
71Inventor score
Filing activity: May 25, 2001 → Aug 21, 2012
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7321126B2 | Collector with fastening devices for fastening mirror shells | Physics | 22 | Expired |
| US7196841B2 | Lighting system, particularly for use in extreme ultraviolet (EUV) lithography | Physics | 22 | Expired |
| US7015489B2 | Collector having unused region for illumination systems using a wavelength less than or equal to 193 nm | Physics | 20 | Expired |
| US6603615B2 | Precision positioning apparatus for positioning a component especially an optical component | Physics | 18 | Expired |
| US6844994B2 | Optical element deformation system | Physics | 16 | Expired |
| US7354168B2 | Facet mirror having a number of mirror facets | Physics | 13 | Expired |
| US6897599B2 | System for damping oscillations | Physics | 10 | Expired |
| US7244954B2 | Collector having unused region for illumination systems using a wavelength ≦193 nm | Physics | 9 | Expired |
| US7460212B2 | Collector configured of mirror shells | Physics | 9 | Active |
| US6700715B2 | Oscillation damping system | Physics | 9 | Expired |
| US6836530B2 | Illumination system with a plurality of individual gratings | Physics | 7 | Expired |
| US6655808B2 | Focusing-device for the radiation from a light source | Physics | 6 | Expired |
| US7410265B2 | Focusing-device for the radiation from a light source | Physics | 6 | Expired |
| US7090362B2 | Facet mirror having a number of mirror facets | Physics | 4 | Expired |
| US7580207B2 | Optical apparatus comprising an optical component and an adjustment device and method for influencing a polarization state of the optical component | Physics | 3 | Active |
| US7091505B2 | Collector with fastening devices for fastening mirror shells | Physics | 3 | Expired |
| US7034998B2 | Method of connecting a multiplicity of optical elements to a basic body | Emerging Cross-Sectional Technologies | 1 | Expired |
| US8269947B2 | Optical system for semiconductor lithography | Physics | 1 | Active |
| US8454230B2 | Method and system for indirect determination of local irradiance in an optical system | Physics | 1 | Active |
| US7871171B2 | Focusing-device for the radiation from a light source | Physics | 0 | Active |
| US9383544B2 | Optical system for semiconductor lithography | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.