Cleaning method and method for manufacturing electronic device
US8454754B2 · kind B2 · utility
5Cited by
1References
17Claims
0Family size
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Key dates
| Filing date | Feb 8, 2008 |
| Grant date | Jun 4, 2013 |
| Priority date | — |
| Expiry date | Jan 13, 2030 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/6708
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A cleaning method includes: producing an oxidizing solution by electrolysis of sulfuric acid; and cleaning a workpiece with the oxidizing solution. The oxidizing solution is heated by heat of mixing to clean the workpiece. A method for manufacturing an electronic device includes: producing a workpiece; producing an oxidizing solution by electrolysis of sulfuric acid; and cleaning the workpiece with the oxidizing solution. The oxidizing solution is heated by heat of mixing to clean the workpiece.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.