Patent · US Active

Cleaning of an extraction aperture of an ion source

US8455839B2 · kind B2 · utility

1Cited by

14References

14Claims

0Family size

Assignee

Varian Semiconductor Equipment Associates, Inc. · US

Inventors

Craig R. Chaney · Rockport, US
Alexander S. Perel · Danvers, US
Neil J. Bassom · Hamilton, US
Leo V. Klos · Newburyport, US

Key dates

Filing date	Mar 10, 2010
Grant date	Jun 4, 2013
Priority date	—
Expiry date	Nov 26, 2031

Classification

Technology area (CPC H)Electricity
CPC primaryH01J2237/024
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

An ion source includes an arc chamber housing defining an arc chamber having an extraction aperture, and a wiper. The wiper is positioned within the arc chamber in a parked position and configured to be driven from the parked position to operational positions to clean the extraction aperture. A cleaning sub-assembly for an ion source includes a wiper configured to be positioned within an arc chamber of the ion source when in a parked position and driven from the parked position to operational positions to clean an extraction aperture of the ion source.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.