Apparatus and method for charge neutralization during processing of a workpiece
US8461554B1 · kind B1 · utility
3Cited by
3References
19Claims
0Family size
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Key dates
| Filing date | Dec 7, 2011 |
| Grant date | Jun 11, 2013 |
| Priority date | — |
| Expiry date | Dec 19, 2031 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/0044
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A processing system may include a plasma source for providing a plasma and a workpiece holder arranged to receive ions from the plasma. The processing system may further include a pulsed bias circuit electrically coupled to the plasma source and operable to switch a bias voltage supplied to the plasma source between a high voltage state in which the plasma source is biased positively with respect to ground and a low voltage state in which the plasma source is biased negatively with respect to the ground.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.