Gas mixer and manifold assembly for ALD reactor
US8465801B2 · kind B2 · utility
12Cited by
14References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 5, 2009 |
| Grant date | Jun 18, 2013 |
| Priority date | — |
| Expiry date | Apr 12, 2031 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T137/87652
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A system and method for mixing a plurality of gases for an atomic layer deposition (ALD) reactor. The mixer is configured to mix the plurality of gases while minimizing the potential for re-circulation within the mixer. The mixer is further configured to maintain the flow velocity of the plurality of gases as the gases pass through the mixer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.