ASM America, Inc.
312Patents
140Active
312Granted
63Portfolio score
Filing activity: Apr 24, 1986 → Apr 11, 2023 · 95 expiring within 5 years
Most-cited patents
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6511539B1 | Apparatus and method for growth of a thin film | Emerging Cross-Sectional Technologies | 918 | Expired |
| US9017481B1 | Process feed management for semiconductor substrate processing | Electricity | 716 | Active |
| US6053982A | Wafer support system | Electricity | 649 | Expired |
| US7297641B2 | Method to form ultra high quality silicon-containing compound layers | Electricity | 593 | Expired |
| US7611751B2 | Vapor deposition of metal carbide films | Chemistry; Metallurgy | 581 | Active |
| US6743738B2 | Dopant precursors and processes | Emerging Cross-Sectional Technologies | 573 | Expired |
| US7122085B2 | Sublimation bed employing carrier gas guidance structures | Chemistry; Metallurgy | 563 | Expired |
| US8367528B2 | Cyclical epitaxial deposition and etch | Electricity | 557 | Active |
| US8137462B2 | Precursor delivery system | Chemistry; Metallurgy | 546 | Active |
| US6325858A | Long life high temperature process chamber | Physics | 540 | Expired |
| US6093252A | Process chamber with inner support | Electricity | 540 | Expired |
| US8278176B2 | Selective epitaxial formation of semiconductor films | Electricity | 540 | Active |
| US8216380B2 | Gap maintenance for opening to process chamber | Electricity | 538 | Active |
| USD614153S1 | Reactant source vessel | General | 538 | Expired |
| US6594550B1 | Method and system for using a buffer to track robotic movement | Physics | 531 | Expired |
| US8071452B2 | Atomic layer deposition of hafnium lanthanum oxides | Electricity | 531 | Active |
| US8287648B2 | Method and apparatus for minimizing contamination in semiconductor processing chamber | Electricity | 530 | Active |
| US8877655B2 | Systems and methods for thin-film deposition of metal oxides using excited nitrogen-oxygen species | Electricity | 529 | Active |
| US8986456B2 | Precursor delivery system | Chemistry; Metallurgy | 528 | Active |
| US8883270B2 | Systems and methods for thin-film deposition of metal oxides using excited nitrogen—oxygen species | Chemistry; Metallurgy | 527 | Active |
| US7498242B2 | Plasma pre-treating surfaces for atomic layer deposition | Electricity | 526 | Active |
| US8802201B2 | Systems and methods for thin-film deposition of metal oxides using excited nitrogen-oxygen species | Chemistry; Metallurgy | 521 | Active |
| US7713874B2 | Periodic plasma annealing in an ALD-type process | Electricity | 521 | Active |
| US8076237B2 | Method and apparatus for 3D interconnect | Emerging Cross-Sectional Technologies | 520 | Active |
| US6692576B2 | Wafer support system | Electricity | 517 | Expired |
Source: USPTO / EPO open patent data. Counts and citation impact are objective bibliographic measures.