Patent · US Active

Irradiation with high energy ions for surface structuring and treatment of surface proximal sections of optical elements

US8466047B2 · kind B2 · utility

0Cited by

8References

19Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Martin Weiser · Sinsheim, DE
Stefan Burkhart · Dillingen an der Donau, DE
Holger Maltor · Aalen, DE

Key dates

Filing date	Apr 23, 2012
Grant date	Jun 18, 2013
Priority date	—
Expiry date	Apr 25, 2032

Classification

Technology area (CPC H)Electricity
CPC primaryH01J2237/3151
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A method for processing the surface of a component, or the processing of an optical element through an ion beam, directed onto the surface to be processed, whereby the surface is lowered and/or removed at least partially, and wherein the ions have a kinetic energy of 100 keV or more, as well as optical elements processed in accordance with the method.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.