Pattern generation systems and high bandwidth focus control system with suppressed reaction forces and noise
US8467117B2 · kind B2 · utility
0Cited by
12References
39Claims
0Family size
Assignee
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Key dates
| Filing date | Sep 1, 2010 |
| Grant date | Jun 18, 2013 |
| Priority date | — |
| Expiry date | Sep 8, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70766
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A pattern generation system includes an optical system and a rotor. The optical system is configured to project a laser image onto an optical scanner. The rotor has a plurality of optical arms arranged at a first angle relative to one another, and further includes the optical scanner. The laser image is sequentially reflected by the optical scanner into each of the plurality of optical arms of the rotor to generate a pattern on a workpiece.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.