Compound and photoresist composition containing the same
US8475999B2 · kind B2 · utility
1Cited by
1References
5Claims
0Family size
Assignee
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Key dates
| Filing date | Aug 6, 2010 |
| Grant date | Jul 2, 2013 |
| Priority date | — |
| Expiry date | Nov 28, 2030 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC07C2603/74
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
The present invention provides a compound represented by the formula (C1):wherein Rc2 represents a C6-C10 aromatic hydrocarbon group having at least one nitro group and Rc1 represents a group represented by the formula (1):wherein Rc4 represents a hydrogen atom etc., Rc5 represents a C1-C30 divalent hydrocarbon group, and Rc3 represents a group represented by the formula (3-1), (3-2) or (3-3):wherein Rc6, Rc7, Rc8, Rc9, Rc10, Rc11, Rc12, Rc13 and Rc14 each independently represent a C1-C30 hydrocarbon group, and a photoresist composition comprising a resin, an acid generator and the compound represented by the formula (C1).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.