High reliability-high voltage junction termination with charge dissipation layer

US8476691B1 · kind B1 · utility

Assignee

• Microsemi Corporation · US

Inventors

• Dumitru Sdrulla · Bend, US
• Duane Edward Levine · Bend, US
• James M. Katana · Bend, US
• Martin David Birch · Louisville, US

Key dates

• Filing date: Feb 18, 2011
• Grant date: Jul 2, 2013
• Expiry date: Sep 5, 2031

Classification

• Technology area (CPC H): Electricity
• CPC primary: H10D64/112

Abstract

A high voltage power semiconductor device includes high reliability-high voltage junction termination with a charge dissipation layer. An active device area is surrounded by a junction termination structure including one or more regions of a polarity opposite the substrate polarity. A tunneling oxide layer overlays the junction termination area surrounding the active device area in contact with the silicon substrate upper surface. A layer of undoped polysilicon overlays the tunneling oxide layer and spans the junction termination area, with connections to an outer edge of the junction termination structure and to a grounded electrode inside of the active area. The tunneling oxide layer has a thickness that permits hot carriers formed at substrate upper surface to pass through the tunneling oxide layer into the undoped polysilicon layer to be dissipated but sufficient to mitigate stacking faults at the silicon surface.