Patent · US Active

Salt and photoresist composition containing the same

US8481242B2 · kind B2 · utility

0Cited by
3References
10Claims
0Family size

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Inventors

Key dates

Filing dateNov 16, 2010
Grant dateJul 9, 2013
Priority date—
Expiry dateJan 7, 2031

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC07C2603/74
  • WIPO fieldOrganic fine chemistry
  • WIPO sectorChemistry

Abstract

A salt represented by the formula (X):

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.