Multi-table lithographic systems, lithography processing tools and methods for processing workpieces
US8488105B2 · kind B2 · utility
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18Claims
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Key dates
| Filing date | Feb 11, 2010 |
| Grant date | Jul 16, 2013 |
| Priority date | — |
| Expiry date | Dec 7, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70733
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithographic workpiece processing tool includes a loading area for loading a workpiece; and a processing area for processing a workpiece. The workpiece processing tool further includes a multi-table system arranged between the loading area and the processing area. The multi-table system includes at least two tables configured to pass each other while moving between the loading area and the processing area. Each of the at least two tables is configured to hold a workpiece.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.