Patent · US Active

Methods of forming electronic devices

US8492068B2 · kind B2 · utility

8Cited by

3References

10Claims

0Family size

Assignee

Rohm and Haas Electronic Materials LLC · US

Inventors

Young Cheol Bae · Weston, US
Thomas Cardolaccia · Natick, US
Yi-Chen Liu · Hsinchu, TW

Key dates

Filing date	Jun 28, 2010
Grant date	Jul 23, 2013
Priority date	—
Expiry date	Dec 1, 2030

Classification

Technology area (CPC H)Electricity
CPC primaryH01L2924/0002
WIPO fieldSemiconductors
WIPO sectorElectrical engineering

Abstract

Methods of forming electronic devices are provided. The methods involve alkaline treatment of photoresist patterns and allow for the formation of high density resist patterns. The methods find particular applicability in semiconductor device manufacture.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.