FTP memory device programmable and erasable at cell level
US8493787B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 21, 2010 |
| Grant date | Jul 23, 2013 |
| Priority date | — |
| Expiry date | Oct 10, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11C2216/10
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
An embodiment of non-volatile memory device integrated in a chip of semiconductor material is proposed. The memory includes at least one sector of a plurality of memory cells; each sector includes a storage region of a first type of conductivity and a further storage region of a second type of conductivity. Each memory cell includes a first region and a second region of the second type of conductivity, which are formed in the storage region for defining a storage transistor of floating gate MOS type of the first type of conductivity; the memory cell likewise includes a further first region and a further second region of the first type of conductivity, which are formed in the further storage region for defining a further storage transistor of floating gate MOS type of the second type of conductivity. The memory cell also includes a common floating gate of the storage transistor and the further storage transistor. The memory device further includes programming means for programming each memory cell individually by programming the corresponding floating gate through the corresponding storage transistor, and erasing means for erasing each memory cell individually by erasing the corresp…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.