Depth mapping using optical elements having non-uniform focal characteristics
US8494252B2 · kind B2 · utility
61Cited by
61References
20Claims
0Family size
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Key dates
| Filing date | Jun 19, 2008 |
| Grant date | Jul 23, 2013 |
| Priority date | — |
| Expiry date | Jan 5, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2207/30196
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A method for mapping includes projecting a pattern onto an object (28) via an astigmatic optical element (38) having different, respective focal lengths in different meridional planes (54, 56) of the element. An image of the pattern on the object is captured and processed so as to derive a three-dimensional (3D) map of the object responsively to the different focal lengths.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.