Oxidation-stabilized CMP compositions and methods
US8497209B2 · kind B2 · utility
1Cited by
11References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 21, 2010 |
| Grant date | Jul 30, 2013 |
| Priority date | — |
| Expiry date | Oct 1, 2031 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23F3/06
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
The present invention provides a chemical-mechanical polishing (CMP) composition comprising an amino compound, a radical-forming oxidizing agent, a radical trapping agent capable of inhibiting radical-induced oxidation of the amino compound, and an aqueous carrier therefore. The radical trapping agent is a hydroxyl-substituted polyunsaturated cyclic compound, a nitrogenous compound, or a combination thereof. Optionally, the composition comprises a metal oxide abrasive (e.g., silica, alumina, titania, ceria, zirconia, or a combination of two or more of the foregoing abrasives).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.