Inventor · Naperville, IL, US

Phillip W. Carter

42Patents
16h-index
61Co-inventors
84Inventor score

Filing activity: Aug 13, 1996 → Aug 27, 2021

Most-cited inventions

PatentTitleAreaCited byStatus
US6776810B1 Anionic abrasive particles treated with positively charged polyelectrolytes for CMP Chemistry; Metallurgy 55 Expired
US9402570B2 Analyte sensor devices, connections, and methods Human Necessities 43 Active
US6936543B2 CMP method utilizing amphiphilic nonionic surfactants Electricity 38 Expired
US7071105B2 Method of polishing a silicon-containing dielectric Electricity 28 Expired
US6821897B2 Method for copper CMP using polymeric complexing agents Electricity 27 Expired
US6431953B1 CMP process involving frequency analysis-based monitoring Physics 25 Expired
US8178120B2 Methods for processing substrates having an antimicrobial coating Human Necessities 25 Active
US9693713B2 Analyte sensor devices, connections, and methods Human Necessities 21 Active
US6590051B1 High molecular weight zwitterionic polymers Textiles; Paper 21 Expired
US7306637B2 Anionic abrasive particles treated with positively charged polyelectrolytes for CMP Chemistry; Metallurgy 21 Expired
US6313246A High molecular weight zwitterionic polymers Textiles; Paper 20 Expired
US11179068B2 Analyte sensor devices, connections, and methods Human Necessities 19 Active
US7442645B2 Method of polishing a silicon-containing dielectric Electricity 18 Expired
US11051725B2 Analyte sensor devices, connections, and methods Human Necessities 18 Active
US6444091B1 Structurally rigid nonionic and anionic polymers as retention and drainage aids in papermaking Textiles; Paper 17 Expired
US11051724B2 Analyte sensor devices, connections, and methods Human Necessities 16 Active
US6017994A Utility of water-soluble polymers having pendant derivatized amide functionalities for scale control Chemistry; Metallurgy 12 Expired
US8486169B2 Method of polishing a silicon-containing dielectric Electricity 12 Active
US7846842B2 Polishing composition and method for high silicon nitride to silicon oxide removal rate ratios Chemistry; Metallurgy 10 Active
US7316603B2 Compositions and methods for tantalum CMP Chemistry; Metallurgy 10 Expired
US9931066B2 Analyte sensor devices, connections, and methods Human Necessities 10 Active
US7504044B2 Polishing composition and method for high silicon nitride to silicon oxide removal rate ratios Chemistry; Metallurgy 10 Expired
US9528030B1 Cobalt inhibitor combination for improved dishing Electricity 6 Active
US6612911B2 Alkali metal-containing polishing system and method Chemistry; Metallurgy 5 Expired
US7732393B2 Oxidation-stabilized CMP compositions and methods Chemistry; Metallurgy 5 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.