Patent · US Active

Leveler compounds

US8506788B2 · kind B2 · utility

2Cited by
19References
7Claims
0Family size

Assignee

Inventors

Key dates

Filing dateSep 11, 2012
Grant dateAug 13, 2013
Priority date
Expiry dateSep 11, 2032

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH05K3/423
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

Leveling agents for metal plating baths are provided. Plating baths containing such leveling agents provide metal deposits having substantially level surfaces. Such leveling agents may be selected to selectively incorporate desired levels of impurities into the metal deposit.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.