Patent · US Active

Particle beam microscopy system and method for operating the same

US8507854B2 · kind B2 · utility

3Cited by

14References

24Claims

0Family size

Assignee

Carl Zeiss Microscopy GmbH · DE

Inventors

Wolfram Buehler · Karlsruhe, DE
Holger Doemer · Bopfingen, DE
Matthias Lang · Berching, DE
Joerg Stodolka · Aalen, DE
Peter Roediger · San Diego, US
Emmerich Bertagnolli · Munich, DE
Heinz Wanzenboeck · Wien, AT

Key dates

Filing date	Jul 13, 2010
Grant date	Aug 13, 2013
Priority date	—
Expiry date	Jan 4, 2031

Classification

Technology area (CPC H)Electricity
CPC primaryH01J2237/3174
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

A particle beam system 1 for cleaning itself comprises an irradiation system to direct electromagnetic radiation onto the surfaces to be cleaned and a supply system 61 to supply a precursor gas to the interior of the vacuum chamber 11 of the particle beam system 1. The precursor gas is activated in a vicinity of the surfaces to be cleaned and is converted into a reaction gas which reacts with the contaminants present on the irradiated surfaces such that said contaminants may be pumped out then.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.