Inductive modulation of focusing voltage in charged beam system
US8507855B2 · kind B2 · utility
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27Claims
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Key dates
| Filing date | Jul 28, 2011 |
| Grant date | Aug 13, 2013 |
| Priority date | — |
| Expiry date | Oct 5, 2031 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/21
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A modulator of a charged particle beam system is arranged to generate a modulation signal that is provided to an inductor, which receives the modulation signal and modulates, by inductance, a supply voltage signal for the charged particle beam system. Modulation of the supply voltage signal changes a focal length of a charged particle beam produced by the charged particle beam system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.