Two-dimensional arrays of holes with sub-lithographic diameters formed by block copolymer self-assembly
US8512846B2 · kind B2 · utility
19Cited by
94References
24Claims
0Family size
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Key dates
| Filing date | May 14, 2012 |
| Grant date | Aug 20, 2013 |
| Priority date | — |
| Expiry date | May 14, 2032 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24182
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Methods for fabricating sublithographic, nanoscale microstructures in two-dimensional square and rectangular arrays utilizing self-assembling block copolymers, and films and devices formed from these methods are provided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.