Multilayer reflective film coated substrate for a reflective mask, reflective mask blank, and methods of manufacturing the same
US8512918B2 · kind B2 · utility
9Cited by
1References
24Claims
0Family size
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Inventor
Key dates
| Filing date | Mar 23, 2010 |
| Grant date | Aug 20, 2013 |
| Priority date | — |
| Expiry date | Aug 21, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/708
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
By forming on a substrate a reference point mark having a concave or convex shape with its side walls being generally upright, even if a multilayer reflective film, an absorber film, and so on are formed over the reference point mark, sufficient contrast for inspection light is obtained so that the position of the reference point mark can be identified with high accuracy.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.