Patent · US Active

Crosslinkable graft polymer non preferentially wetted by polystyrene and polyethylene oxide

US8513359B2 · kind B2 · utility

20Cited by
97References
14Claims
0Family size

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Key dates

Filing dateSep 13, 2012
Grant dateAug 20, 2013
Priority date
Expiry dateSep 13, 2032

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T428/24612
  • WIPO fieldMicro-structural and nano-technology
  • WIPO sectorChemistry

Abstract

Methods for fabricating a random graft PS-r-PEO copolymer and its use as a neutral wetting layer in the fabrication of sublithographic, nanoscale arrays of elements including openings and linear microchannels utilizing self-assembling block copolymers, and films and devices formed from these methods are provided. In some embodiments, the films can be used as a template or mask to etch openings in an underlying material layer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.