Patent · US Active

Semiconductor device and method of manufacturing same

US8513810B2 · kind B2 · utility

6Cited by
5References
15Claims
0Family size

Assignee

Inventor

Key dates

Filing dateJul 29, 2009
Grant dateAug 20, 2013
Priority date
Expiry dateOct 17, 2029

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L2924/3025
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

There is provided a semiconductor device and a manufacturing method therefor, the semiconductor device requiring flip-chip mounting of a fine pitch electrode, wherein the fine electrode is easily manufactured, resin sealing is not required, and reliability can be improved. In the semiconductor device, one or more LSI chips (1), having an insulating layer (3) surface and an electrode (2) surface on one side, and a substrate (4), having an insulating layer (6) surface and an electrode (5) surface on one side, are bonded by having surfaces of the electrodes and surfaces of the insulating layers face each other via a bonding layer (7) made in a thin film form, in a region excluding the surfaces of the electrodes (2, 5) and the surfaces of the insulating layers (3, 6) in areas surrounding the electrodes.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.