Large area patterning of nano-sized shapes
US8529778B2 · kind B2 · utility
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18Claims
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Key dates
| Filing date | Nov 12, 2009 |
| Grant date | Sep 10, 2013 |
| Priority date | — |
| Expiry date | Aug 19, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0002
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
Methods for creating nano-shaped patterns are described. This approach may be used to directly pattern substrates and/or create imprint lithography molds that may be subsequently used to directly replicate nano-shaped patterns into other substrates in a high throughput process.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.