Patent · US Active

Large area patterning of nano-sized shapes

US8529778B2 · kind B2 · utility

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18Claims
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Key dates

Filing dateNov 12, 2009
Grant dateSep 10, 2013
Priority date
Expiry dateAug 19, 2031

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG03F7/0002
  • WIPO fieldMicro-structural and nano-technology
  • WIPO sectorChemistry

Abstract

Methods for creating nano-shaped patterns are described. This approach may be used to directly pattern substrates and/or create imprint lithography molds that may be subsequently used to directly replicate nano-shaped patterns into other substrates in a high throughput process.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.