Mask alignment, rotation and bias monitor utilizing threshold voltage dependence
US8531203B2 · kind B2 · utility
7Cited by
3References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 11, 2010 |
| Grant date | Sep 10, 2013 |
| Priority date | — |
| Expiry date | Nov 10, 2031 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D30/60
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
The present invention provides a method and apparatus for measuring alignment, rotation and bias of mask layers in semiconductor manufacturing by examining threshold voltage variation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.