Gate array architecture with multiple programmable regions
US8533641B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 7, 2011 |
| Grant date | Sep 10, 2013 |
| Priority date | — |
| Expiry date | Nov 8, 2031 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D84/988
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
Systems and methods are disclosed for forming a custom integrated circuit (IC) with a first fixed (non-programmable) region on a wafer with non-customizable mask layers, wherein the first fixed region includes multiplicities of transistors and a first interconnect layer and a second interconnect layer above the first interconnect layer which form base cells; and a programmable region above the first fixed region with customizable mask layers, wherein at least one mask layer in the programmable region is coupled to the second interconnect layer which provides electrical access to all transistor nodes of the base cells and wherein the programmable region comprises a third interconnect layer coupled to the customizable mask layers to customize the IC. A second fixed region may be formed above the programmable region to provide multiple fixed regions and reduce the number of required masks in customizing the custom IC.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.