Method for repairing damage of dielectric film by hydrocarbon restoration and hydrocarbon depletion using UV irradiation
US8535767B1 · kind B1 · utility
508Cited by
1References
17Claims
0Family size
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Key dates
| Filing date | Apr 18, 2012 |
| Grant date | Sep 17, 2013 |
| Priority date | — |
| Expiry date | Apr 18, 2032 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB05D3/061
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method for repairing process-related damage of a dielectric film formed on a substrate caused by processing the dielectric film includes: irradiating the damaged dielectric film with UV light in an atmosphere of hydrocarbon-containing gas to restore the surface of the dielectric film; and irradiating the surface-restored dielectric film with UV light in an atmosphere of oxygen gas to partially remove the hydrocarbon film.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.