Patent · US Active

Protecting bond pad for subsequent processing

US8536044B2 · kind B2 · utility

4Cited by
4References
21Claims
0Family size

Assignee

Inventors

Key dates

Filing dateNov 30, 2010
Grant dateSep 17, 2013
Priority date
Expiry dateDec 22, 2030

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L2924/1461
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

A method for opening a bond pad on a semiconductor device is provided. The method comprises removing a first layer to expose a first portion of the bond pad and forming a protective layer over the exposed first portion of the bond pad. The method further comprises performing subsequent processing of the semiconductor device and removing the protective layer to expose a second portion of the bond pad.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.