Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the same
US8541160B2 · kind B2 · utility
3Cited by
15References
23Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Apr 27, 2011 |
| Grant date | Sep 24, 2013 |
| Priority date | — |
| Expiry date | Aug 24, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/2041
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Provided is an actinic-ray- or radiation-sensitive resin composition excelling in the LWR, pattern collapse performance and DOF, and a method of forming a pattern using the same. The composition according to the present invention contains (A) a resin containing a repeating unit with any of partial structures of general formula (I) below, (B) a compound (PA) as defined in the specification, and (C) a compound being configured to generate an acid when exposed to actinic rays or radiation, wherein the resin is contained in an amount of 50 mass % or more based on total solids of the composition.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.