Barrier structure and nozzle device for use in tools used to process microelectronic workpieces with one or more treatment fluids
US8544483B2 · kind B2 · utility
4Cited by
90References
30Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 15, 2006 |
| Grant date | Oct 1, 2013 |
| Priority date | — |
| Expiry date | Mar 15, 2026 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T137/85938
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Apparatuses, and related methods, for processing a workpiece that include a particular barrier structure that can overlie and cover a workpiece. Apparatuses, and related methods, for processing a workpiece that include a particular movable member that can be positioned over and moved relative to a workpiece. Apparatuses, and related methods, for processing a workpiece that include a particular ceiling structure that can overlie a processing chamber. Nozzle devices, and related methods, that include a particular annular body. Nozzle devices, and related methods, that include a particular first, second, and third nozzle structure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.